Fluid handling – Processes
Patent
1996-11-25
1998-10-27
Hepperle, Stephen M.
Fluid handling
Processes
137565, 137597, 13762418, 137883, F16K 1122
Patent
active
058266070
ABSTRACT:
A dual exhaust controller for maintaining isolation between the flows of two different gases in a chamber. The controller includes first and second gas input valves connected between respective first and second sources of different gases and a processing chamber. A pump is fluidly connected to the chamber for exhausting gases therefrom and has first and second gas exhaust valves connected to an outlet of the pump. A gas flow control interlocks the signals operating the gas input valves with the states of first and second gas exhaust valves which exhaust the respective first and second gases from the chamber, so that the different gases are exhausted independently.
REFERENCES:
patent: 2178559 (1939-11-01), Cohen et al.
patent: 5313982 (1994-05-01), Ohmi et al.
patent: 5368062 (1994-11-01), Okumura
patent: 5590686 (1997-01-01), Prendergast
Knutson Paul L.
Rodriguez Benjamin Garcia
Bastianelli John
Hepperle Stephen M.
Sony Corporation
Sony Electronics Inc.
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