Etching a substrate: processes – Forming or treating mask used for its nonetching function
Patent
1996-01-16
1997-10-21
Angebranndt, Martin
Etching a substrate: processes
Forming or treating mask used for its nonetching function
216 52, 216 20, 216 80, 216 65, 216 19, 216 47, 216 49, 216 76, 437228SEN, 430320, 430312, 430311, B44C 122
Patent
active
056792670
ABSTRACT:
A novel reticulated array comprises islands of ceramic (e.g. BST 40) which are fabricated from novel materials using unique methods of patterning. A shallow etch stop trench (46) is first ion milled around each ceramic island on the front side and then filled with an etch step material (e.g. parylene 48). An optical coat (e.g transparent metal layer 54, transparent organic layer 56 and conductive metallic layer 58) is elevated above the etch step material by an elevation layer (e.g. polyimide 49). For some applications, it has been experimentally verified that there is no loss, and sometimes a measured increase, in optical efficiency when the optical coating is not planar in topology. Novel fabrication methods also provide for the convenient electrical and mechanical bonding of each of the massive number of ceramic islands to a signal processor substrate (e.g. Si 86) containing a massive array of sensing circuits.
REFERENCES:
patent: 3359192 (1967-12-01), Heinrich et al.
patent: 4080532 (1978-03-01), Hopper
patent: 4139444 (1979-02-01), Singer et al.
patent: 4662984 (1987-05-01), Ohtake et al.
patent: 4740700 (1988-04-01), Shabam et al.
patent: 4745278 (1988-05-01), Hanson
patent: 4792681 (1988-12-01), Hanson
patent: 4926051 (1990-05-01), Turnbull
patent: 4927771 (1990-05-01), Ferrett
patent: 5115442 (1992-05-01), Lee et al.
patent: 5426304 (1995-06-01), Belcher et al.
patent: 5466331 (1995-11-01), Belcher
patent: 5466332 (1995-11-01), Owen et al.
D. J. Warner, D. J. Pedder, J. S. Moody, and J. Burrage, "The Preparation and Performance of Reticulated Targets for the Pyroelectric Vidicon", Ferroelectrics, 33, 1981, pp. 249-253.
R. Watton, F. Ainger, S. Porter, D. Pedder and J. Gooding, "Technologies and Performance for Linear and Two Dimensional Pyroelectric Arrays", SPIE vol. 510, Infrared Technology X, 1984, pp. 139-140.
T. D. Flaim, G. A. Barner, and T. Brewer, "A Novel Release Layer syster for IC Processing", Brewer Science, Inc. Rolla, Missouri, presented at KTI IF Conference, Nov. 1989.
C. Hanson, H. Beratan, R. Owen, and K. Sweetser, "Low-Cost Uncooled Focal Plane Array Technology", Texas Instruments Incorporated, DSEG, presented at IRIS Specialty Group on Infrared Detectors, Bedford, MA, Jul. 14, 1993.
C. Hanson, "Uncooled Thermal Imaging at Texas Instruments", SPIE 1993, International Symposium on Optics, Imaging and Instrumentation, Infrared Technology XIX, San Diego, Jul. 14, 1993.
H. Kaufman, R. Robinson, W. Hughes, "Characteristics, Capabilities, and Applications of Broad-Beam Sources", Commonwealth Scientific Corporation, Alexandria, Virginia, 1987.
R. Watton, "Ferroelectrics for Infrared Detection and Imaging", ISAF '86, Proceedings of the Sixth IEEE International Symposium on Applications of Ferroelectrics, Jun. 1986.
Belcher James F.
Owen Robert A.
Angebranndt Martin
Carlson Brian A.
Donaldson Richard L.
Kesterson James C.
Texas Instruments Incorporated
LandOfFree
Dual etching of ceramic materials with an elevated thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dual etching of ceramic materials with an elevated thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual etching of ceramic materials with an elevated thin film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1004131