Dual detector system for determining endpoint of plasma etch pro

Details Dual detector system for determining endpoint of plasma etch pro Dual detector system for determining endpoint of plasma etch pro

1984-10-22

1987-09-22

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PG, 219121PF, 156345, 156646, 20419233, B23K 1500

Patent

active

046957006

ABSTRACT:
A dual detector spectroscopic endpoint determination system is used which has dual channels that enables the combination of channels to increase gain, cancel out background noise, and to use either one or more spectroscopic channels.

REFERENCES:
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patent: 4318767 (1982-03-01), Hijikata et al.
patent: 4336438 (1982-06-01), Uehara et al.
patent: 4430547 (1984-02-01), Yoneda et al.
patent: 4442338 (1984-04-01), Yamazaki
patent: 4528438 (1985-07-01), Poulsen et al.
IBM Disclosure Bulletin--vol. 24, #10--3/1982, "Method for Servoing Magnetic Thin Film Disc."

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