Dual-circuit, multiple-effect refrigeration system and method

Refrigeration – Refrigeration producer – Sorbent type

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F25B 700

Patent

active

054676142

ABSTRACT:
A dual circuit absorption refrigeration system comprising a high temperature single-effect refrigeration loop and a lower temperature double-effect refrigeration loop separate from one another and provided with a double-condenser coupling therebetween. The high temperature condenser of the single-effect refrigeration loop is double coupled to both of the generators in the double-effect refrigeration loop to improve internal heat recovery and a heat and mass transfer additive such as 2-ethyl-1-hexanol is used in the lower temperature double-effect refrigeration loop to improve the performance of the absorber in the double-effect refrigeration loop.

REFERENCES:
patent: 3483710 (1969-12-01), Bearint
patent: 4520634 (1985-06-01), Oouchi et al.
patent: 4531374 (1985-07-01), Alefeld
patent: 4542628 (1985-09-01), Sarkisian et al.
patent: 4551991 (1985-11-01), Miyoshi et al.
patent: 4646541 (1987-03-01), Reid et al.
patent: 4667485 (1987-05-01), Ball et al.
patent: 4732008 (1988-03-01), DeVault
patent: 4827728 (1989-05-01), De Vault et al.
patent: 5177979 (1993-01-01), Gianfrancesco
patent: 5205136 (1993-04-01), DeVault et al.
patent: 5295371 (1994-03-01), Oonou et al.
patent: 5335515 (1994-08-01), Rockenfeller et al.

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