Dual chamber volatilization system

Furnaces – With exhaust gas treatment means – Afterburning means

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110214, 110246, 432106, F23B 500

Patent

active

049477676

ABSTRACT:
A system for removing volatilizable organic contaminants from solid materials has a primary volatilizer and a secondary volatilizer positioned in series. A charging system continuously loads solid materials which have been blended to contain a predetermined concentration of contaminants into the primary volatilizer. A portion of the contaminants are volatilized in the primary volatilizer. The solid materials and the volatilized contaminants are transfered to the secondary volatilizer where the volatilized contaminants are burned to provide heat for help in volatilizing the remainder of the contaminants. The solid material which is now decontaminated is quenched. The gases are treated to convert the remaining volatilized contaminants to harmless gases and water vapor. Particulate material is removed from the gases. Nitrogen oxides and sulpher are also converted to harmless forms.

REFERENCES:
patent: 3267890 (1966-08-01), Zinn et al.
patent: 4038032 (1977-07-01), Brewer et al.
patent: 4153411 (1979-05-01), Isheim
patent: 4245571 (1981-01-01), Przewalski
patent: 4304550 (1981-12-01), Heian
patent: 4667609 (1987-05-01), Hardison et al.
patent: 4738206 (1988-04-01), Noland
patent: 4859177 (1989-08-01), Kreisberg et al.

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