Dual cathode sputter coating apparatus

Details Dual cathode sputter coating apparatus Dual cathode sputter coating apparatus

1995-02-08

1996-09-24

Breneman, R. Bruce

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429808, 20429811, 20429812, C23C 1454

Patent

active

055587518

ABSTRACT:
In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark space shield surrounds both electrodes (2, 3) and targets (9, 10) together.

REFERENCES:
patent: 3562142 (1971-02-01), Lamont, Jr.
patent: 3718572 (1973-04-01), Robinson et al.
patent: 4560462 (1985-12-01), Radford et al.
patent: 5169509 (1992-06-01), Latz et al.
patent: 5372694 (1994-12-01), Szczyrbowski
Standley et al. (IBM Tech Disclosure Bulletin), "Mosaic Cathode Structure for Large Sputtering Systems" vol. 9 No. 2 Jul. 1966 pp. 190.

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