Dual carbon nanotubes for critical dimension metrology on...

Geometrical instruments – Distance measuring – Single contact with a work engaging support

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07997002

ABSTRACT:
A probe capable of measuring recesses in features such as apertures and/or trench-like structures of very small size is comprised of one or more carbon nanotubes (CNTs) which is oriented at an angle and, if two or more CNTs are employed, such that they cross (with or without touching each other) at a location separated from ends of the carbon nanotubes which approximates the depth of the aperture or trench-like structure and at an angle such that the ends of the carbon nanotubes extends by a lateral distance greater than a dimension of a recess of a feature to be measured or in excess of a sidewall angle or an angle of a crystal lattice of a material in which a feature to be measured is formed.

REFERENCES:
patent: 6683305 (2004-01-01), Lu et al.
patent: 6780664 (2004-08-01), Goruganthu et al.
patent: 6881955 (2005-04-01), Lu et al.
patent: 6887365 (2005-05-01), Naughton
patent: 6930307 (2005-08-01), Takazawa et al.
patent: 6985377 (2006-01-01), Rust
patent: 7094616 (2006-08-01), Archie et al.
patent: 7180061 (2007-02-01), Lu
patent: 7214303 (2007-05-01), Naughton
patent: 7368712 (2008-05-01), Boye et al.
patent: 7462270 (2008-12-01), Naughton
patent: 7495215 (2009-02-01), Akinaga et al.
patent: 2004/0173744 (2004-09-01), Takazawa et al.
patent: 2005/0211896 (2005-09-01), Lu et al.
patent: 2009/0113739 (2009-05-01), Lu
patent: 2010/0003500 (2010-01-01), Stevens
patent: 2010/0005553 (2010-01-01), Jin et al.
J. Martinez et al.; “Length control and Sharpening of Atomic Force Microscope Carbon Nanotube Tips Assisted by an Electron Beam”; Journal; Nanotechnology 16 (2005); pp. 2493-2496.
T. Kawano et al.; “Selective Vapor-Liquid-Solid Epitaxial Growth of Micro-Si Probe Electrode Arrays with On-Chip MOSFETs on Si (111) Substrates”; Journal; IEEE Transactions of Electronic Devices, vol. 51, No. 3; Mar. 2004; pp. 415-420.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dual carbon nanotubes for critical dimension metrology on... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual carbon nanotubes for critical dimension metrology on..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual carbon nanotubes for critical dimension metrology on... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2649191

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.