Dual beam system

Details Dual beam system Dual beam system

2006-12-18

2009-10-13

Vanore, David A. (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S492210, C250S493100, C250S492100, C250S3960ML

Reexamination Certificate

active

07601976

ABSTRACT:
A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

REFERENCES:
patent: 4345152 (1982-08-01), Gerlach
patent: 6051839 (2000-04-01), Crewe
patent: 6218663 (2001-04-01), Nisch et al.
patent: 6303932 (2001-10-01), Hamamura et al.
patent: 6335532 (2002-01-01), Tanaka et al.
patent: 6515287 (2003-02-01), Notte, IV
patent: 6566897 (2003-05-01), Lo et al.
J.B. Pawley, Use of Pseudo-Stereo Techniques to Detect Magnetic Stray Field in the SEM, 1987, pp. 134-136, vol. 9.

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