Dry strip antihalation layer for photothermographic film

Details Dry strip antihalation layer for photothermographic film Dry strip antihalation layer for photothermographic film

1983-05-24

1984-10-16

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430510, 430514, 430517, 430348, 430350, 430617, G03C 178

Patent

active

044775628

ABSTRACT:
A photothermographic element having a strippably-adhered, radiation-absorbing, antihalation layer is disclosed. The element comprises at least one imageable layer adhered to one surface of a support base, and an antihalation layer having a resistance greater than 1500 ohms per square, strippably adhered to any exposed surface of said element, said antihalation layer having a delaminating resistance in the range of 6 to 50 g/cm, a layer strength in g/cm greater than its delaminating resistance, and an optical density of at least 0.1.

REFERENCES:
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patent: 3457075 (1969-07-01), Morgan et al.
patent: 3619335 (1971-11-01), Bryan
patent: 3779771 (1973-12-01), Gatzke
patent: 3839049 (1972-07-01), Simons
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patent: 4271263 (1981-06-01), Gottert
patent: 4308379 (1981-12-01), Goettert
patent: 4311787 (1982-01-01), Lemahieu et al.
patent: 4376162 (1982-03-01), Kawata et al.
patent: 4409316 (1983-10-01), Zeller-Penprey

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