Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1998-03-03
2000-08-29
Lovering, Richard D.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
252 62, 516 34, 516111, C01B 33158, C01B 3316, B01J 1300
Patent
active
061104396
ABSTRACT:
A wet silica gel can be prepared by a process comprising the steps of contacting a stable, aqueous, fluid, silica system having a pH greater than 7.5 with an ion exchange resin which removes metal ions and replaces them with H+ ions and thereby reduces the pH to less than 5.0, adding an organic liquid to the aqueous silica system, providing, however, that the organic liquid added stays in one phase with the aqueous, silica, system, and does not cause the silica to precipitate, and adding a base to the silica system so that the pH of the silica system is in the range of from about 5.0 to about 7.5, and allowing the wet silica gel to form. The wet silica gel formed by this process is characterized by its high organic solvent content and the low concentration of basic metal ions.
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Deshpande Ravindra
Stover Lisa A.
Armstrong World Industries Inc.
Lovering Richard D.
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