Dry-processing apparatus

Details Dry-processing apparatus Dry-processing apparatus

1985-06-10

1986-11-25

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118724, 118 501, 156345, 156643, 20419232, H01L 21306

Patent

active

046242147

ABSTRACT:
In a dry-processing apparatus adapted for vapor phase deposition or vapor phase etching, the processing space in its processing chamber is covered with a cooled member provided for trapping reflecting active particles and preventing degassing, thereby permitting processing with gas of high purity substantially free from impurities. The active particles are incident upon a workpiece in a unidirectional flow. Means for uniformalyzing the direction of movement of active particles may be further provided. The apparatus is especially useful for vertical etching of a semiconductor substrate with neutral radicals.

REFERENCES:
patent: 3213825 (1965-10-01), Cooper et al.
patent: 3233137 (1966-02-01), Anderson et al.
patent: 3310424 (1967-03-01), Wehner et al.
patent: 3598710 (1971-08-01), Davidse
patent: 4192706 (1980-03-01), Horiike
patent: 4259145 (1981-03-01), Harper et al.
patent: 4265730 (1981-05-01), Hirose et al.
patent: 4292384 (1981-09-01), Straughan et al.
patent: 4406733 (1983-09-01), Tachi
Gloerser, "Masking for Ion Beam Etching", Solid State Technology, pp. 68-73, Apr. 1976.
Kaufman et al, "Technology and Applications of Broad-Beam Ion . . . ", J. Vac. Sci. Tech., vol. 21, No. 3, Sep./Oct. 1982, pp. 725-736.
"The Roles of Ions and Neutral Active Species in Microwave Plasma Etching", by Keizo Suzuki et al., J. Electrochem. Soc.: Solid-State Science and Technology, vol. 126, No. 6, pp. 1024-1028.

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