Dry process for forming positive tone micro patterns

Details Dry process for forming positive tone micro patterns Dry process for forming positive tone micro patterns

1983-12-12

1985-03-26

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156643, 156646, 427 431, 430310, B05D 306

Patent

active

045073317

ABSTRACT:
A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films of organometallic, including organosilicon compounds and metals, exposing the etch barrier film to a low energy proton beam in a patternwise manner, and developing the pattern by means of oxygen reactive ion etching.

REFERENCES:
patent: 4004044 (1977-01-01), Franco et al.
patent: 4332879 (1982-06-01), Pastor et al.
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4396702 (1983-08-01), Desai et al.
patent: 4396704 (1983-08-01), Taylor
patent: 4405710 (1983-09-01), Balasubramanyam et al.
patent: 4414059 (1983-11-01), Blum et al.
patent: 4417748 (1983-11-01), Mayne-Banton et al.
IBM Technical Disclosure Bulletin, vol. 20, No. 6, Nov. 1977, p. 2208, "Masking Material for the Reactive Ion Etching of Metals", by Feng et al.

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