Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1997-03-11
1999-02-23
Bell, Janyce
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427 64, 427 68, 427215, 427221, 4273977, 4274071, B05D 506
Patent
active
058741356
ABSTRACT:
Dry-powdered, silica-coated phosphor particles for use in manufacturing a CRT screen are dispersively coated with silica particles on the surface thereof to enhance the flow characteristics of the phosphor particles according to the present invention. A method of manufacturing the dry-powdered, silica-coated phosphor particles comprises the steps of sequentially first-dispersing silica particles in methanol, slowly adding dry-powdered phosphor particles to said silica-dispersed methanol, second-dispersing methanol in the silica-dispersed phosphor particles-adding methanol, filtering said resultant methanol of the second-dispersing step, drying the filtered resultant of the filtering step, and sieving the dried resultant of the drying step through a screen.
REFERENCES:
patent: 4287229 (1981-09-01), Watanabe et al.
patent: 4675278 (1987-06-01), Sugimoto et al.
patent: 4921727 (1990-05-01), Datta et al.
patent: 4921767 (1990-05-01), Datta et al.
patent: 4975619 (1990-12-01), Datta et al.
patent: 5167990 (1992-12-01), Tono et al.
patent: 5336834 (1994-08-01), Zarchy et al.
Shon Ho Seok
Yoon Sang Youl
Bell Janyce
Orion Electric Co. Ltd.
LandOfFree
Dry-powdered, silica-coated prosphor particles for use in manufa does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dry-powdered, silica-coated prosphor particles for use in manufa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry-powdered, silica-coated prosphor particles for use in manufa will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-304684