Dry photosensitive lithographic plate comprising a silicon rubbe

Details Dry photosensitive lithographic plate comprising a silicon rubbe Dry photosensitive lithographic plate comprising a silicon rubbe

1987-06-18

1989-05-02

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430160, 430162, 430166, 430167, 430272, 430303, G03C 152, G03F 702, G03F 710

Patent

active

048267520

ABSTRACT:
A dry photosensitive lithographic printing plate has a base, a photosensitive layer formed on the base and a silicone rubber layer formed on the photosensitive layer. The silicone rubber layer is formed from a silicon rubber composition containing an organopolysiloxane and a reactive aromatic aminosilane compound.

REFERENCES:
patent: 3945830 (1976-03-01), Yazawa et al.
patent: 3953212 (1976-04-01), Miyano et al.
patent: 4347303 (1982-08-01), Asano et al.
patent: 4358522 (1982-11-01), Fujita et al.
patent: 4496647 (1985-01-01), Kawabe et al.
patent: 4690886 (1987-09-01), Naritomi et al.

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