Dry film resist and production of resist images

Details Dry film resist and production of resist images Dry film resist and production of resist images

1985-12-18

1988-02-16

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

430259, 430260, 430263, 430262, 430285, 430287, 430288, 430910, 522100, 522101, 522102, 522103, G03C 1112, G03C 168

Patent

active

047255242

ABSTRACT:
In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.

REFERENCES:
patent: 3469982 (1969-09-01), Celeste
patent: 4304923 (1981-12-01), Rousseau

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