Dry etching system

Details Dry etching system Dry etching system

1996-04-26

1998-02-17

Powell, Willam

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

1566261, 216 60, H01L 2100

Patent

active

057187967

ABSTRACT:
An etching system including a chamber, lower and upper electrodes provided in the chamber, a plasma light monitoring window provided in a side wall of the chamber, and an endpoint detecting device mounted outside the plasma light monitoring window. The plasma light monitoring window may be formed of high-purity aluminum oxide (Al.sub.2 O.sub.3) as a transparent ceramic, so that plasma light generated in the chamber can be efficiently transmitted through the plasma light monitoring window to the endpoint detecting device. Accordingly, even when the plasma light monitoring window is etched, its transparency is not lost. Furthermore, since the content of impurity in the window is low, contamination of an object to be etched with the impurity can be suppressed.

REFERENCES:
patent: 4479848 (1984-10-01), Otsubo et al.
patent: 5045149 (1991-09-01), Nulty

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