Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2011-03-15
2011-03-15
Norton, Nadine G (Department: 1713)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S058000, C438S706000
Reexamination Certificate
active
07906030
ABSTRACT:
A WC substrate7is etched by using plasma50generated from a mixed gas of a gas including a halogen atom and a gas including a nitrogen atom.
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Murakami Tomoyasu
Nakagawa Hideo
Sasago Masaru
Lin Patti
McDermott Will & Emery LLP
Norton Nadine G
Panasonic Corporation
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