Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-12-12
1983-03-15
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
156345, 156643, 204192E, C23F 100, C23C 1500
Patent
active
043766927
ABSTRACT:
In a dry etching device comprising a first electrode supplied with an electrical voltage and a second electrode grounded, a dielectric plate is placed on the second electrode and includes means for positioning a specimen to be etched. The specimen is brought into electrical contact with the second electrode by the positioning means and is, therefore, substantially grounded during etching. The positioning means may be a through hole for receiving the specimen therein. Alternatively, the positioning member may be a conductive spring passing through the dielectric plate. A plurality of positioning members may be arranged in the dielectric plate.
REFERENCES:
patent: 3474021 (1969-10-01), Davidse et al.
patent: 4134817 (1979-01-01), Bourdon
patent: 4253907 (1981-03-01), Parry et al.
patent: 4268374 (1981-05-01), Lepselter
patent: 4270999 (1981-06-01), Hassan et al.
patent: 4298443 (1981-11-01), Maydan
Tsukada Tsutomu
Ukai Katsumi
Anelva Corporation
Weisstuch Aaron
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