Dry etching device comprising a member for bringing a specimen i

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

156345, 156643, 204192E, C23F 100, C23C 1500

Patent

active

043766927

ABSTRACT:
In a dry etching device comprising a first electrode supplied with an electrical voltage and a second electrode grounded, a dielectric plate is placed on the second electrode and includes means for positioning a specimen to be etched. The specimen is brought into electrical contact with the second electrode by the positioning means and is, therefore, substantially grounded during etching. The positioning means may be a through hole for receiving the specimen therein. Alternatively, the positioning member may be a conductive spring passing through the dielectric plate. A plurality of positioning members may be arranged in the dielectric plate.

REFERENCES:
patent: 3474021 (1969-10-01), Davidse et al.
patent: 4134817 (1979-01-01), Bourdon
patent: 4253907 (1981-03-01), Parry et al.
patent: 4268374 (1981-05-01), Lepselter
patent: 4270999 (1981-06-01), Hassan et al.
patent: 4298443 (1981-11-01), Maydan

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