Dry etching device

Details Dry etching device Dry etching device

1980-12-11

1982-07-27

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192E, 156345, C23C 1500, C23F 100

Patent

active

043416160

ABSTRACT:
A dry etching device is provided in which on at least one portion of the path of etchant movement from the plasma production region to the etching workpiece a resin coating containing atoms or molecules of the same type as the chemically active atoms or molecules which constitute the etchant, is formed.

REFERENCES:
patent: 4073669 (1978-02-01), Heinecke et al.
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4264393 (1981-04-01), Gorin et al.

Affiliated with

Also associated with

Rating

Dry etching device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry etching device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry etching device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2023958