Dry etching apparatus with diluted anhydrous hydrogen fluoride g

Details Dry etching apparatus with diluted anhydrous hydrogen fluoride g Dry etching apparatus with diluted anhydrous hydrogen fluoride g

1991-04-08

1992-03-31

Fisher, Richard V.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156646, 141 63, 141 66, C23F 102

Patent

active

051004950

ABSTRACT:
Dry etching apparatus composed of any of metal, silica, ceramic or combination thereof with a processing chamber in which substrates are placed and a diluted anhydrous hydrogen fluoride gas generator, the processing chamber being connected to the diluted anhydrous hydrogen fluoride gas generator through a pipe line of stainless steel or nickel. There is also disclosed a dry-etching method with the dry-etching apparatus, and a diluted anhydrous hydrogen gas generator used in the dry-etching apparatus and dry-etching method.

REFERENCES:
patent: 4749440 (1988-06-01), Blackwood et al.

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