Dry etching apparatus using reactive ions

Details Dry etching apparatus using reactive ions Dry etching apparatus using reactive ions

1984-02-08

1985-07-02

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 204298, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

045266433

ABSTRACT:
A dry etching apparatus using reactive ions is disclosed. A housing in which a workpiece is etched is provided with a cathode electrode on which the workpiece is mounted, and an anode electrode arranged opposite the cathode electrode. An etching gas is supplied to the housing, and pressure inside of the housing is held at a certain level. High frequency voltage is applied between the cathode and anode electrodes. A plurality of magnets are arranged outside of the housing to generate magnetic fields around the cathode electrode. The plurality of magnets are separated from one another, with a predetermined clearance being interposed therebetween, to form an endless track. The plurality of magnets are moved along the endless track, to thereby cause the magnetic fields to be moved in one direction on the cathode electrode.

REFERENCES:
patent: 4481062 (1984-11-01), Kaufman et al.
patent: 4483737 (1984-11-01), Mantei
Patent Abstracts of Japan, vol. 2, No. 10, Jan. 25, 1978, pp. 10358E77 & JP-A-52-126176, 10358E77 & JP-A-52-126177.

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