Dry etching apparatus, dry etching method, and plate and...

Details Dry etching apparatus, dry etching method, and plate and... Dry etching apparatus, dry etching method, and plate and...

2003-08-27

2008-12-02

Alanko, Anita K (Department: 1792)

Etching a substrate: processes

Etching and coating occur in the same processing chamber

C216S041000, C216S042000, C216S067000, C438S714000

Reexamination Certificate

active

07459098

ABSTRACT:
A dry etching apparatus that performs etching on a substrate1placed on a tray13inside a chamber18by covering the substrate1with a plate14provided with opening portions15,in which a distance D between the surface opposing the substrate1and the substrate1in the peripheral portion of the plate14is set shorter than the distance D between the surface opposing the substrate1and the substrate1in the central portion of the plate14. Textures can be thus formed homogeneously on the surface of the substrate.

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