Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1987-11-20
1989-06-13
Schor, Kenneth M.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 427 47, 118723, 118729, 118501, 118623, C23F 102
Patent
active
048389781
ABSTRACT:
A dry etching apparatus which includes an anode located at an upper side and a cathode located at a lower side which face each other in a vacuum vessel. A high-frequency power can be applied across the anode and the cathode. A flange section extends from the inner wall of the vacuum vessel, and is located between the anode and the cathode. A semiconductor wafer can be placed on the cathode through a tray. The cathode is moved toward the anode together with the tray and the wafer. When the edge portion of the tray abuts against the flange section, the interior of the vacuum vessel is partitioned into an etching chamber and the other chamber. A magnetic field is applied to the etching chamber from outside the vacuum vessel, and an etching gas is also introduced into the etching chamber. When the etching gas is introduced, the interior of the etching chamber is evacuated to be maintained at a predetermined pressure.
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Tegal 1500: Rie/Plasma Production Series.
Arikado Tsunetoshi
Horiike Yasuhiro
Okano Haruo
Sekine Makoto
Johnson L.
Kabushiki Kaisha Toshiba
Schor Kenneth M.
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