Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1990-06-15
1992-04-28
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 156646, 20429835, 20429836, H01L 21306, B44C 122, C03C 1500, C03C 2506
Patent
active
051085356
ABSTRACT:
A dry etching apparatus includes a discharge room in which a gas plasma is created by a discharge, an ejection nozzle for ejecting the plasma gas, a first vacuum room into which the plasma gas is introduced through the ejecting nozzle by supersonic expansion of the plasma gas, and a second vacuum room including a skimmer for extracting a supersonic molecular flow, the supersonic molecular flow of the plasma gas taken into the second vacuum room being blown against the material to be etched.
REFERENCES:
Suzuki et al., "Anisotropic Etching . . . Beam", Journal of Applied Physics 64 (7), Oct. 1988, pp. 3697-3705.
Geis et al., "Hot-Jet Etching . . . Si", Journal of Vacuum Science Technology B5(1), 1987, pp. 363-365.
Ono Kouichi
Oomori Tatsuo
Mitsubishi Denki & Kabushiki Kaisha
Powell William A.
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