Dry etching apparatus

Details Dry etching apparatus Dry etching apparatus

1980-06-26

1981-11-03

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 156657, 204192E, 204298, 250531, C23F 102, H01L 21306, C03C 1500, C03C 2506

Patent

active

042984190

ABSTRACT:
A dry etching apparatus using microwaves according to the present invention is equipped with means for impressing such an AC voltage upon a sample as has a frequency ranging from 100 KHx to 10 MHx. Consequently, the sample has its surface prevented from being charged up no matter which it might be made of an insulator or might have its surface covered with an insulator. As a result, the etching rate can be maintained at a high level even for such sample.

REFERENCES:
patent: 4101411 (1978-07-01), Suzuki et al.
patent: 4253907 (1981-03-01), Parry

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