Dry etching apparatus

Details Dry etching apparatus Dry etching apparatus

1985-07-11

1986-10-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156635, 156643, 156646, 156657, 156662, 20419232, 204298, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

046157565

ABSTRACT:
An etching apparatus according to the present invention comprises means to generate metastable excited species such as of nitrogen or rare gas molecules, means to transfer the metastable excited species into a reaction chamber in which a substrate to-be-etched is set, and means to introduce a reactive gas for etching into the reaction chamber in which the substrate to-be-etched is set; the reactive gas being activated by collision between the metastable excited species and the reactive gas so as to etch the substrate to-be-etched owing to a reaction between the activated reactive gas and the substrate to-be-etched. Further, a light source for photo-exciting the substrate to-be-etched may well be added.

REFERENCES:
patent: 2841477 (1958-07-01), Hall
patent: 3095341 (1963-06-01), Ligenza
patent: 4260649 (1981-04-01), Dension et al.
patent: 4478677 (1984-10-01), Chen et al.
patent: 4490211 (1984-12-01), Chen et al.
patent: 4508749 (1985-04-01), Brannon et al.

Affiliated with

Also associated with

Rating

Dry etching apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry etching apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry etching apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-641560