Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Image layer portion transfer and element therefor
Patent
1981-03-27
1982-11-02
Downey, Mary F.
Radiation imagery chemistry: process, composition, or product th
Transfer procedure between image and image layer, image...
Image layer portion transfer and element therefor
430252, 430256, 430281, 430314, 430315, 430323, 430324, G03C 500
Patent
active
043574130
ABSTRACT:
A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer comprising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit.
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patent: 4127436 (1978-11-01), Friel
patent: 4291114 (1981-09-01), Berggren et al.
Cohen Abraham B.
Gervay Joseph E.
Downey Mary F.
E. I. Du Pont de Nemours and Company
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