Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Image layer portion transfer and element therefor
Patent
1980-04-28
1981-09-15
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Transfer procedure between image and image layer, image...
Image layer portion transfer and element therefor
430281, 430314, 430323, 430324, 430496, 430905, 430907, 430908, G03C 1112, G03C 168
Patent
active
042898412
ABSTRACT:
A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer comprising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit.
REFERENCES:
patent: 3202508 (1965-08-01), Heiart
patent: 3264103 (1966-08-01), Cohen et al.
patent: 3353955 (1967-11-01), Colgrove
patent: 3469982 (1969-09-01), Celeste
patent: 3607264 (1971-09-01), Celeste
patent: 3770438 (1973-11-01), Celeste
patent: 4058443 (1977-11-01), Murata et al.
patent: 4127436 (1978-11-01), Friel
Cohen Abraham B.
Gervay Joseph E.
E. I. Du Pont de Nemours and Company
Kimlin Edward C.
LandOfFree
Dry-developing photosensitive dry film resist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dry-developing photosensitive dry film resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry-developing photosensitive dry film resist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-391431