Dry coating method

Details Dry coating method Dry coating method

1993-06-04

1995-01-03

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427237, 427238, 427307, 427535, 427539, 427540, 427571, 427575, B05D 306

Patent

active

053785070

ABSTRACT:
A continuous dry coating method and an apparatus therefor which are capable of removing cut chips and burrs from and smoothing inner walls of small-diameter holes in a substrate material and, then, successively performing a cold coating on these small holes in a short period of time. The continuous dry process coating method comprises the steps of: arranging electrodes on opposite sides of a substrate material; performing a plasma discharge to surface-treat small holes made in the substrate material; and then performing an electron cyclotron resonance plasma (ECR plasma) coating on the surfaces of these holes.

REFERENCES:
Patent Abstracts of Japan, vol. 016, No. 063 (C-0911) 18 Feb. 1992 & JP-A-03 260 073 (Fuji Electric Co. Ltd) 20 Nov. 1991--Abstract.

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