Dry cleaning process for cleaning a surface

Details Dry cleaning process for cleaning a surface Dry cleaning process for cleaning a surface

1996-06-19

1998-03-10

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 3, 134 2, 134 21, B08B 500, C23F 100, C03C 2300

Patent

active

057256772

ABSTRACT:
A dry cleaning method for removing metal contaminants from a surface of an oxide film such that no substantial etching of the oxide film occurs, includes the steps of supplying a halide gas containing an element that is selected from the group IIIa elements, group IVa elements and the group Va elements in a form of halide, to the oxide film, thereby dry cleaning the surface of the oxide film.

REFERENCES:
patent: 5030319 (1991-07-01), Nishimo et al.
patent: 5213622 (1993-05-01), Bohling et al.
Ringi Sugino et al., "Ultra Violet Excited Cl-radical etching of Si through Native oxides", Journal of Applied Physics, vol. 76, No. 9, 1 Nov. 1994.
Sugino et al, IEICE Trans, Electron. vol. E75-C, No. 7, Jul., 1992, pp. 829-833.
Sugino et al, Extended Abstract of SSDM '87, Aug. 25-27, 1987.

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