Droplet jet method for coating flat substrates with resist or si

Details Droplet jet method for coating flat substrates with resist or si Droplet jet method for coating flat substrates with resist or si

1995-07-26

1999-03-23

Beck, Shrive

Coating processes

Spraying

Moving the base

427240, 239 3, 239 4, 2391022, B05D 102, B05B 5025

Patent

active

058856617

ABSTRACT:
An apparatus and method are provided for efficiently and effectively coating a substantially flat surface, i.e., a substrate, with a high-viscosity chemical such as photoresist. The chemical is dispensed through a piezo electrically controlled droplet jet cartridge on to the surface. The thickness of the chemical coating is controlled by controlling the rate at which chemical is dispensed through the droplet jet cartridge. A number of droplet jet cartridges are aligned such that gaps in chemical dispensed by one droplet jet cartridge are filled by chemical dispensed by other droplet jet cartridges. An array of droplet jet cartridges which spans the width of the surface moves across the surface to coat the surface with chemical in a single pass. To coat a circular surface, the surface is spun while a droplet jet cartridge is moved from the center of the surface to the outer edge of the surface. Chemical is dispensed on to the surface in a helical pattern.

REFERENCES:
patent: 4267212 (1981-05-01), Sakawaki
patent: 4580148 (1986-04-01), Domoto et al.
patent: 4696885 (1987-09-01), Vijan
patent: 4938994 (1990-07-01), Choinski
patent: 4963882 (1990-10-01), Hickman
patent: 4992808 (1991-02-01), Bartky et al.
patent: 5229171 (1993-07-01), Donovan et al.

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