Drip chemical delivery method and apparatus

Details Drip chemical delivery method and apparatus Drip chemical delivery method and apparatus

1996-03-18

1998-03-03

Warden, Robert J.

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

134902, B08B 700

Patent

active

057230196

ABSTRACT:
A drip chemical delivery system used in semiconductor substrate cleaning processes. A drip chemical delivery system which uses small openings in a pipe (holes) and a low air pressure to saturate the brushes in a double sided brush system. This drip delivery system reduces the volumes of chemical solutions used in a scrubbing process and helps to maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a double sided scrubber.

REFERENCES:
patent: 3411973 (1968-11-01), Siler
patent: 3691582 (1972-09-01), Call
patent: 3928064 (1975-12-01), Holm
patent: 4569695 (1986-02-01), Yamashita et al.
patent: 4578120 (1986-03-01), Chiarella
patent: 4730360 (1988-03-01), Brugelmann
patent: 4862570 (1989-09-01), Bald et al.
patent: 5131968 (1992-07-01), Wells et al.
patent: 5206970 (1993-05-01), Johnson
patent: 5392491 (1995-02-01), Hwang et al.
patent: 5398363 (1995-03-01), Medearis et al.
Webster's II, New Riverside University Dictionary, The Riverside Publishing Company, 1994.

Affiliated with

Also associated with

Rating

Drip chemical delivery method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Drip chemical delivery method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Drip chemical delivery method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2244889