Drip chemical delivery apparatus

Details Drip chemical delivery apparatus Drip chemical delivery apparatus

1996-07-29

1998-12-29

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

1566381, 1566391, H01L 2100

Patent

active

058535225

ABSTRACT:
A drip chemical delivery system used in semiconductor substrate cleaning processes. A drip chemical delivery system which uses small openings in a pipe (holes) and a low air pressure to saturate the brushes in a double sided brush system. This drip delivery system reduces the volumes of chemical solutions used in a scrubbing process and helps to maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a double sided scrubber.

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patent: 5392491 (1995-02-01), Hwang et al.
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