Drip catching apparatus for receiving excess photoresist develop

Details Drip catching apparatus for receiving excess photoresist develop Drip catching apparatus for receiving excess photoresist develop

1998-02-13

1999-08-17

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396611, 396627, 118 52, 156345, 427240, G03D 500

Patent

active

059406518

ABSTRACT:
A drip catching apparatus includes a trough 2 formed by a sidewall 26 and a drip catching surface 28 to prevent excess drops of a photoresist developer solution from dripping onto a semiconductor wafer 8 in a photoresist development cup 4. One or more holes 30 may be provided to drain the photoresist developer solution received by the drip trough 2.

REFERENCES:
patent: 5591264 (1997-01-01), Sugimoto et al.
patent: 5611886 (1997-03-01), Bachman et al.
patent: 5705223 (1998-01-01), Bunkofske

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