Abrading – Machine – Combined
Reexamination Certificate
2005-05-31
2005-05-31
Nguyen, Dung Van (Department: 3723)
Abrading
Machine
Combined
C451S443000, C451S444000
Reexamination Certificate
active
06899604
ABSTRACT:
A dressing apparatus dresses a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer in a polishing apparatus. The dressing apparatus comprises a dresser body (31) connected to a dresser drive shaft (23) which is vertically movable, a dresser plate (32) which is vertically movable with respect to the dresser body (31), and a dressing member (22) held by the dresser plate (32) for dressing the polishing surface (1a).
REFERENCES:
patent: 5885137 (1999-03-01), Ploessl
patent: 6200199 (2001-03-01), Gurusamy et al.
patent: 6217429 (2001-04-01), Hoey
patent: 6263605 (2001-07-01), Vanell
patent: 6572446 (2003-06-01), Osterheld et al.
patent: 59-81056 (1984-05-01), None
patent: 11-58217 (1999-03-01), None
patent: 2000-202758 (2000-07-01), None
patent: 2000-343406 (2000-12-01), None
patent: 2001-246550 (2001-09-01), None
patent: 99/50022 (1999-10-01), None
Kojima Shunichiro
Noji Ikutaro
Takada Nobuyuki
Togawa Tetsuji
Ebara Corporation
Nguyen Dung Van
Wenderoth , Lind & Ponack, L.L.P.
LandOfFree
Dressing apparatus and polishing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dressing apparatus and polishing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dressing apparatus and polishing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3461224