Dressing apparatus and polishing apparatus

Abrading – Machine – Combined

Reexamination Certificate

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Details

C451S443000, C451S444000

Reexamination Certificate

active

06899604

ABSTRACT:
A dressing apparatus dresses a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer in a polishing apparatus. The dressing apparatus comprises a dresser body (31) connected to a dresser drive shaft (23) which is vertically movable, a dresser plate (32) which is vertically movable with respect to the dresser body (31), and a dressing member (22) held by the dresser plate (32) for dressing the polishing surface (1a).

REFERENCES:
patent: 5885137 (1999-03-01), Ploessl
patent: 6200199 (2001-03-01), Gurusamy et al.
patent: 6217429 (2001-04-01), Hoey
patent: 6263605 (2001-07-01), Vanell
patent: 6572446 (2003-06-01), Osterheld et al.
patent: 59-81056 (1984-05-01), None
patent: 11-58217 (1999-03-01), None
patent: 2000-202758 (2000-07-01), None
patent: 2000-343406 (2000-12-01), None
patent: 2001-246550 (2001-09-01), None
patent: 99/50022 (1999-10-01), None

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