Dressing apparatus and method

Details Dressing apparatus and method Dressing apparatus and method

1995-12-13

1997-07-01

Rose, Robert A.

Abrading

Accessory

Tool cleaner

451271, 451287, 451 56, 451211, 451270, B24B 2118, B24B 3300, B24B 4726, B24B 5500

Patent

active

056430671

ABSTRACT:
A dressing apparatus is used to resurface a polishing surface of a polish cloth used to polish semiconductor wafers. A dressing brush which spins on its own axis is also coupled to a drive shaft of a main drive of the dressing apparatus through a planetary gear mechanism so that the brush will rotate or orbit about the drive shaft. Therefore, the dressing brush traces a complex path and its dressing action is spread over a wide surface area of the polishing cloth to produce thorough resurfacing of the polishing surface. The service life of the cloth is significantly increased and contributes to improving the overall efficiency of preparing high quality polished semiconductor wafers. For economy, the dressing apparatus can be mounted easily on a conventional polishing apparatus having a dressing facility.

REFERENCES:
patent: 3393474 (1968-07-01), Buswell
patent: 5105583 (1992-04-01), Hammond et al.
patent: 5259144 (1993-11-01), Yeh
patent: 5384986 (1995-01-01), Hirose et al.
patent: 5486131 (1996-01-01), Cesna et al.

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