Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent
1995-09-08
1997-11-25
Acquah, Samuel A.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
528335, 528338, 528348, 25218311, 264164, 264165, 264178F, 264184, 264346, C08G 6908, B29C 5100, D01D 500
Patent
active
056914431
ABSTRACT:
Aramids which after drawing have high tensile strengths and tensile moduli are made from units derived from selected 2,2'-disubstituted-4,4'-diaminobiphenyls, p-phenylenediamine, oxydianiline and terephthalic acid. Also disclosed is a process for drawing such aramids at least 1.5%, which results in the drawn aramid having significant crystallinity and higher tensile strength. The aramids are useful for ropes and composites.
REFERENCES:
patent: 3349062 (1967-10-01), Hill et al.
patent: 3869429 (1975-03-01), Blades
patent: 3869430 (1975-03-01), Blades
patent: 4075172 (1978-02-01), Ozawa et al.
patent: 4384107 (1983-05-01), Rogers et al.
patent: 4413114 (1983-11-01), Shimada et al.
patent: 4461886 (1984-07-01), Rogers et al.
patent: 4500278 (1985-02-01), Cochran et al.
patent: 4507467 (1985-03-01), Shimada et al.
patent: 4525413 (1985-06-01), Rogers et al.
patent: 4785038 (1988-11-01), Sweeny
patent: 5274071 (1993-12-01), Santa et al.
patent: 5346985 (1994-09-01), Irwin
Ozawa, S., "A New Approach to High Modulus, High Tenacity Fibers", Poly. J., 19(1), 119-125 (1987) The month of publication not available.
Acquah Samuel A.
E. I. Du Pont de Nemours and Company
Hampton-Hightower P.
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