Drapable diamond thin films and method for the preparation...

Plastic and nonmetallic article shaping or treating: processes – Gas or vapor deposition of article forming material onto...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S249800, C427S336000, C156S060000

Reexamination Certificate

active

07147810

ABSTRACT:
Wetted thin diamond films which are drapable are described. The films are mounted on various substrates and used as windows for electromagnetic radiation or form a surface coating on an article of manufacture.

REFERENCES:
patent: 4585668 (1986-04-01), Asmussen et al.
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4792772 (1988-12-01), Asmussen et al.
patent: 4925701 (1990-05-01), Jansen et al.
patent: 5216249 (1993-06-01), Jones et al.
patent: 5311103 (1994-05-01), Asmussen et al.
patent: 5355568 (1994-10-01), Imai et al.
patent: 5366579 (1994-11-01), Yamazaki et al.
patent: 5432004 (1995-07-01), Tanabe et al.
patent: 5490963 (1996-02-01), Fleischer et al.
patent: 5587013 (1996-12-01), Ikegaya et al.
patent: 5594966 (1997-01-01), Goldman
patent: 5622586 (1997-04-01), Vaitkus et al.
patent: 5645937 (1997-07-01), Noda
patent: 5660936 (1997-08-01), Williams
patent: 5821544 (1998-10-01), Augustus et al.
patent: 6163401 (2000-12-01), Igarashi
patent: 6335863 (2002-01-01), Yamamoto et al.
patent: 6511700 (2003-01-01), Airoldi et al.
patent: 2004/0154526 (2004-08-01), Mearini et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Drapable diamond thin films and method for the preparation... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Drapable diamond thin films and method for the preparation..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Drapable diamond thin films and method for the preparation... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3666502

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.