DRAM having deep trench capacitors with lightly doped buried...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257SE29342, C257SE29346, C257SE21396, C438S386000, C438S389000, C438S243000

Reexamination Certificate

active

07923815

ABSTRACT:
By controlling buried plate doping level and bias condition, different capacitances can be obtained from capacitors on the same chip with the same layout and deep trench process. The capacitors may be storage capacitors of DRAM/eDRAM cells. The doping concentration may be less than 3E19cm−3, a voltage difference between the biases of the buried electrodes may be at least 0.5V, and a capacitance of one capacitor may be at least 1.2 times, such as 2.0 times the capacitance of another capacitor.

REFERENCES:
patent: 3387286 (1968-06-01), Dennard
patent: 4688063 (1987-08-01), Lu et al.
patent: 5047815 (1991-09-01), Yasuhira et al.
patent: 6001684 (1999-12-01), Shen
patent: 6316310 (2001-11-01), Wensley et al.
patent: 6509226 (2003-01-01), Jaiprakash et al.
patent: 6566191 (2003-05-01), Hsu et al.
patent: 6738300 (2004-05-01), Barth, Jr.
patent: 6831997 (2004-12-01), Kamon
patent: 6847076 (2005-01-01), Tsou et al.
patent: 7141853 (2006-11-01), Campbell et al.
patent: 7388244 (2008-06-01), Ho et al.
patent: 7554148 (2009-06-01), Su et al.
patent: 2005/0280063 (2005-12-01), Cheng et al.

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