Semiconductor device manufacturing: process – Making passive device – Trench capacitor
Patent
1998-02-04
1999-07-06
Chaudhuri, Olik
Semiconductor device manufacturing: process
Making passive device
Trench capacitor
438396, 257306, H01L 218242
Patent
active
059207850
ABSTRACT:
A twin bit DRAM cell capable of storing two bits of digital data as stored charge within the DRAM cell is disclosed. The twin bit DRAM cell has two pass transistors, a trench capacitor, and a stack capacitor. The pass transistors each have a source connected to a bit line voltage generator to control placement of the charge within the twin bit DRAM cell, a gate connected to a word line voltage generator to control activation of the DRAM cells, and a drain. The trench capacitor has a top plate connected to the drain of the first pass transistor and a bottom plate connected to a first biasing voltage source. The stack capacitor has a first plate connected to the drain of the second pass transistor and a second plate connected to a second biasing voltage generator. Twin bit DRAM cells will be arranged in a plurality of rows and columns to form an array of twin bit DRAM cells.
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"The Evolution of DRAM Cell Technology", El-Kareh et al, Solid State Technology, May, 1997, pp. 89-101.
Cherng George Meng-Jaw
Chi Min-hwa
Ackerman Stephen B.
Chaudhuri Olik
Coleman WilliamOlik David
Knowles Billy
Saile George O.
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