Draining and drying apparatus of semiconductor materials

Details Draining and drying apparatus of semiconductor materials Draining and drying apparatus of semiconductor materials

1993-10-25

1995-11-28

Gromada, Denise L.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34317, 34186, F26B 1732

Patent

active

054696348

ABSTRACT:
A draining and drying apparatus of semiconductor materials capable of adjusting the rotation balance of a rotor for holding the semiconductor materials without requiring any filling works of dummy semiconductor materials. In a rotary casing, a rotor horizontal moving mechanism is mounted on a rotation main shaft of a rotor, and the rotor is mounted on this rotor horizontal moving mechanism, and the rotor is mechanically moved horizontally in the intersecting direction to the rotation main shaft by the rotor horizontal moving mechanism, so that the rotation balance of the rotor may be adjusted.

REFERENCES:
patent: 4677759 (1987-07-01), Inamura
patent: 4777732 (1988-10-01), Hirano
patent: 4907349 (1990-03-01), Aigo
patent: 4987687 (1991-01-01), Sugimoto

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