Fluid handling – Flow affected by fluid contact – energy field or coanda effect – Means to regulate or vary operation of device
Patent
1992-06-26
1994-02-22
Rutledge, D.
Fluid handling
Flow affected by fluid contact, energy field or coanda effect
Means to regulate or vary operation of device
354324, 137 92, 118688, G03D 500
Patent
active
052892220
ABSTRACT:
A photoresist drainage system for conducting the excess photoresist and solvents from a spin coating machine in a semiconductor fabrication unit is disclosed. The excess photoresist liquid and solvents are channeled directly to an exhaust manifold instead of being collected in a temporary storage tank. From the exhaust manifold the photoresist and solvents flow directly into a factory chemical reclaim system. This substantially reduces the amount of solvent vapors that are drawn into the factory exhaust system.
REFERENCES:
patent: 4185975 (1980-01-01), Scharf
patent: 4518678 (1985-05-01), Allen
patent: 4967782 (1990-11-01), Yamashita et al.
Rutledge D.
Semiconductor Systems, Inc.
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