Draft chamber

Details Draft chamber Draft chamber

1989-10-25

1990-12-11

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

981153, H01L 21306, B01L 100

Patent

active

049768158

ABSTRACT:
A draft chamber is located within a clean room for sequentially immersing and processing carriers such as silicone wafers in a plurality of solution vessels provided in the draft chamber. In the draft chamber, a first air flow moves in a substantially horizontal direction from the front portion of the draft chamber toward the rear portion above the surfaces of solutions contained in chemical solution vessels which generate toxic gasses and a second air flow moves downward from the ceiling of the draft chamber. Thus, the toxic gasses generated from the chemical solution vessels are prevented from leaking into the clean room.

REFERENCES:
patent: 3182466 (1965-05-01), Beckwith
patent: 3396651 (1968-08-01), Kamiya
patent: 3604333 (1971-09-01), Nelson
patent: 3686836 (1972-08-01), Rabilloud et al.
patent: 3728866 (1973-04-01), Layton
patent: 3747505 (1973-07-01), Turko
patent: 3752056 (1973-08-01), Chamberlin et al.
patent: 3994210 (1976-11-01), Davis
patent: 4422369 (1983-12-01), Smets
patent: 4466454 (1984-08-01), Layton
patent: 4637301 (1987-01-01), Shields
patent: 4742764 (1988-05-01), Duvlis

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