Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1999-04-14
2000-12-26
Mills, Gregory
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118733, H05H 100, C23C 1600
Patent
active
061653136
ABSTRACT:
A downstream plasma reactor system is presented. The reactor system includes a reaction chamber. An inlet conduit is connected to the reaction chamber. A plasma tube is coupled to the inlet conduit. A sealing member is interposed between the plasma tube and the inlet conduit. A blocking member, preferably containing a fluorocarbon polymer, is also interposed between the plasma tube and the inlet conduit. The blocking member is positioned closer to the discharge opening of the plasma tube than the sealing member and is preferably capable of preventing a substantial quantity of plasma-generated reactive species from reaching the sealing member during operation of the reactor system.
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patent: 5560803 (1996-10-01), Mihara et al.
patent: 5722668 (1998-03-01), Rice et al.
patent: 5795831 (1998-08-01), Nakayama et al.
4 pgs. of information TFE-O-SIL.RTM. O-Rings downloaded from www.row-inc.com on Jun. 10, 1999.
Khogly Moutasim O.
Melvin Terrance P.
Winters Toby J.
Advanced Micro Devices , Inc.
Daffer Kevin L.
Hassanzadeh Parviz
Mills Gregory
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