Measuring and testing – Liquid analysis or analysis of the suspension of solids in a... – Content or effect of a constituent of a liquid mixture
Patent
1998-08-20
1999-11-02
Williams, Hezron
Measuring and testing
Liquid analysis or analysis of the suspension of solids in a...
Content or effect of a constituent of a liquid mixture
73 1912, 73 6159, 422 681, 340627, B05C 1100, G01N 1502, B03D 300
Patent
active
059748680
ABSTRACT:
The present invention is a contamination measuring device and method of using the same according to a Chemical Mechanical Polishing (CMP) brush cleaner equipment/technology. A collection device is mounted in a brush cleaning device for collecting effluent which flows off of a wafer. The effluent is passed to a particle counter which measures the contamination levels of the effluent. A computer stores the data collected by the particle counter and computes the particles per liter of effluent and provides real time data. The contamination of the effluent corresponds to the contamination of the brushes in the cleaning device and therefore is means for predicting when the brushes in the cleaning device should be replaced.
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DeCain Donald M.
Huynh Cuc K.
Jurjevic Robert A.
Nadeau Douglas P.
Taubenblatt Marc A.
Curcio Robert
International Business Machines - Corporation
Walter, Jr. Howard J.
Wiggins David J.
Williams Hezron
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