Double slide focal plane shutter

Patent

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Details

354250, G03B 920, G03B 908

Patent

active

040054624

ABSTRACT:
Each slide is comprised of an exposure slit defining lamella moved on parallel swinging arms in front of the image aperture, whereby the arms overlap each other in part, as well as the lamella to provide additionally shutter functions for covering portions of the aperture which are to be covered but are not covered by the lamella in any phase of movement or position of deployment.

REFERENCES:
patent: 2975689 (1961-03-01), Chatani
patent: 3580156 (1971-05-01), Loseries
patent: 3810223 (1974-05-01), Kitai et al.
patent: 3847476 (1974-11-01), Onda et al.
patent: 3903539 (1975-09-01), Kitai et al.

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