Double-sided photomask

Details Double-sided photomask Double-sided photomask

1998-09-02

2000-02-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060226455

ABSTRACT:
A double photomask includes two complementary pattern layers respectively formed on each surface of a transparent substrate. A full pattern is a combined pattern of these two complementary pattern layers. These two complementary pattern layers are formed separately on the different surfaces. The double-sided photomask also includes a shifter layer for a phase shifting mask.

REFERENCES:
patent: 5248575 (1993-09-01), Ogoshi
patent: 5358809 (1994-10-01), Van Berkel
patent: 5387484 (1995-02-01), Doany et al.
patent: 5498497 (1996-03-01), Kim et al.
patent: 5733686 (1998-03-01), Shimizu

Affiliated with

Also associated with

Rating

Double-sided photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Double-sided photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Double-sided photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1679498