Double-sided patterning system using dual-wavelength output of a

Details Double-sided patterning system using dual-wavelength output of a Double-sided patterning system using dual-wavelength output of a

1997-10-16

1999-08-03

Rutledge, D.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, 355 26, 355 67, 359615, G03D 2752

Patent

active

059332166

ABSTRACT:
A high-performance projection optical system uses the multiple spectral peaks of an excimer laser system by using an optical dispersive system to physically separate the broadband laser output into separate narrowband beams which can be used for imaging different substrate surfaces simultaneously. The separated narrowband beams are directed along different optical paths and used to illuminate the object planes of different, identical projection lenses. The projection lenses are designed for the narrowed bandwidth corresponding to one spectral peak of the excimer laser rather than the broadband, multiple-peak laser output This dramatically simplifies both the design and the construction of the projection lens, leading to substantial cost-savings. The conversion of the single-beam, broadband spectral output into a multiple-beam, narrowband source is accomplished by optical dispersion means consisting of either several prisms in series, one or more prisms followed by a mirror reflecting back through the prisms, or one or more reflective gratings. The separated narrowband beams are useful for imaging top and bottom of a single substrate with exact registration useful for via-hole connections. Other uses include simultaneous imaging of multiple substrates, using one or more stages.

REFERENCES:
patent: 3907430 (1975-09-01), Mann
patent: 4537378 (1985-08-01), Richter
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 5185625 (1993-02-01), Abe et al.
patent: 5285236 (1994-02-01), Jain
patent: 5359389 (1994-10-01), Isohata

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