Double rim phase shifter mask

Details Double rim phase shifter mask Double rim phase shifter mask

1994-10-05

1995-12-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, 430394, G03F 900

Patent

active

054786789

ABSTRACT:
This invention describes the fabrication and use of a double rim phase shifter mask comprised of patterned layers of phase shifting material, partially transmitting material, and opaque material formed on a transparent substrate. Since the partially transmitting material is used as a rim at the pattern edge the light intensity transmitted to the wafer is not limited by the transmitting percentage of the partially transmitting material. The mask is self aligned and is readily manufacturable. Image resolution and depth of focus is improved over other photomasks.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5288569 (1994-02-01), Lin
"Lithography's Leading Edge, Part 1: Phase-Shift Technology" Pub. in Semiconductor International, Feb. 1992, pp. 42-47.

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