Double-negative positive-working photohardenable elements

Details Double-negative positive-working photohardenable elements Double-negative positive-working photohardenable elements

1977-05-17

1978-10-31

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 68, 96115P, 96115R, G03C 168

Patent

active

041232720

ABSTRACT:
A positive-working imaging element is described comprising a support coated first with a negative-working, solvent-developable, photohardenable stratum, then over-coated with a second negative-working, solvent-developable, photohardenable stratum; the second stratum serves as a mask for the first stratum since it contains ingredients which strongly absorb radiation actinic to the first stratum. The second stratum is imagewise exposed, solvent developed, and the resulting actinically opaque image used as a negative in exposing the first stratum, which is solvent developed to remove the composition in unexposed, but not in exposed areas. Optionally, a separating layer can be present between the photohardenable strata and a cover layer can be present over the second stratum. Positive-working low relief images suitable for lithographic printing plates, printed circuit resists, and contact-speed lithographic films are obtained from the elements of this invention.

REFERENCES:
patent: 3157505 (1964-11-01), Notley
patent: 3674494 (1972-07-01), Hoffmann et al.
patent: 3787211 (1974-01-01), Volkert et al.
patent: 3808004 (1974-04-01), Thomas et al.

Affiliated with

Also associated with

Rating

Double-negative positive-working photohardenable elements does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Double-negative positive-working photohardenable elements, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Double-negative positive-working photohardenable elements will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1833586